Yes Engineering YES-3TA HMDS Vapor Prime Oven

The Trion Phantom III LT RIE (Reactive Ion Etching) is a highly anisotropic and selective etching system which simultaneously uses physical and chemical plasma etching techniques to remove metal films and compound semiconductors.

……………………………………………………………………………………………………………………………………………………………………………………………………………………………..

Key Features

  • Operation temperature ambient to 160° C
  • Handles wafers up to 4”
  • Programmable process time and temperature

 

Key Applications and available processes

  • Vapor prime
  • Vacuum bake

General Documentation

YES-3TA system SOP (standard operation procedure)

Photo of the YES Oven

Contact

Jun Chen or Michael McDonald

 

Check Availability

Already have an account?

Reserve this tool with the FOM.

Need an Account?

Get Started

 

Equipment Fee

Fabrication Service Tier 1