March PX-500 Plasma Asher

The March PX-500 Plasma Asher is a highly versatile plasma etch tool that can etch using a direct plasma configuration, a downstream plasma, and a directional plasma (Reactive Ion Etch). The March Plasma Asher is used for the removal of photoresists from etched wafers, wafer descum, and wafer cleaning prior to wet etching, among other applications. It is capable of high photoresist ashing rates with minimal exposure to electrostatic discharge (ESD).

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Photo of the Plasma Asher

Key Features

  • Stainless Steel chamber taking wafers to 4”
  • 13.56 MHz frequency; power output up to 600 W
  • Microprocessor-controlled
  • Recipe editor for fast, versatile parameter control
  • 2 mass flow controllers (O2 and N2)

Key Applications and available processes

  • Photo-resist stripping
  • Wafer descum/cleaning
  • Etching of passivation layers
  • Cleaning of filters and membranes
  • Chemical trace analysis
  • MEMS
  • Photonics

General Documentation

March Plasma Asher system SOP (standard operation procedure)

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Equipment Fee
Fabrication Service 1