Heidelberg MLA100 Direct Write Lithographer

Heidelberg MLA100 Direct Write Lithographer

The Heidelberg Direct Write Lithography system is a flexible, high resolution pattern generator for direct writing.  The MLA100 creates the design and exposes it directly onto a wafer, no photomask is necessary. ……………………………………………………………………………………………………………………………………………………………………………………………………………………………..

Key Features

  • Minimum feature size down to 1 µm
  • Non-contact exposure
  • Substrates up to 5” x 5”
  • Light source at 365nm
  • Alignment accuracy of 500nm
  • Multiple data input formats

Key Applications and available processes

Fast patterning of masks and wafers in Life Science, MEMS, Micro-Optics, Semiconductor, Sensors, Actuators, Materials Research 

 

General Documentation

MLA100 system SOP (standard operation procedure)

 

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Equipment Fee
Fabrication Service 2