AJA UHV Hybrid sputtering and ebeam evaporation system

The AJA Hybrid System is a physical vapor deposition tool which deposits films on a substrate using sputtering and e-beam evaporation methods. The AJA system is equipped with six magnetron sputtering guns, which use accelerated, positively charged ions from a plasma source to deposit films quickly. Additionally, the AJA Hybrid System contains a 4 crucible electron beam evaporation sources which evaporate high melting point materials, such as refractory metals.

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Key Features

• 6 magnetron sputtering sources with pneumatic source shutters
• 4x15cc pocket E-beam source
• Substrates up to 4”
• DC and RF generators
• Substrate heating (to 800C) and biasing

Key Applications and available processes

• Metal thin film coatings
• Sputtering configured for: Au, Ti, Ag, Al₂O₃, SiO₂, NbTi
• Evaporation configured for: Au, Ti, Pd, V

General Documentation

AJA system SOP (standard operation procedure)