AJA UHV Hybrid sputtering and ebeam evaporation system

The AJA Hybrid System is a PVD tool which deposits films on a substrate by a sputtering and e-beam evaporation methods. AJA system equipped with six magnetron sputtering guns which uses accelerated, positively charged ions from a plasma source to deposit films with an increased deposition rate. In addition AJA system have a 4 crucible ebeam evaporation source which evaporates high melting point materials, such as refractory metals and other metals, using an electron beam.

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Key Features

  • 6 magnetron sputtering sources with pneumatic source shutters
  • 4x15cc pocket E-beam source
  • Substrates up to 4”
  • DC and RF generators
  • Substrate heating(to 800C) and biasing

Key Applications and available processes

  • Metal thin film coatings
  • Sputtering configured for: Au, Ti, Ag, Al2O3, SiO2, NbTi
  • Evaporation configured for: Au, Ti, Pd, V

Photo of the AJA

General Documentation

AJA system SOP (standard operation procedure)

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Equipment Fee
Fabrication Service 2