Dual Beam System

Dual Beam System

Dual Beam System

Seiko Instruments SMI3050SE FIB-SEM with Oxford Instruments Inca XEDS

The Seiko Instruments SMI3050SE FIB-SEM instrument combines a Ga+ focused ion beam column for nanoscale fabrication and a field emission SEM for observation during FIB processing.  The specified image resolution is 4 nm.  The common applications of this instrument are for nanoscale patterning/fabrication or TEM sample preparation.  The ion beam can be used to remove regions of a sample or to deposit W metal in specified locations and patterns.  The material removal process can also be enhanced by the injection of XeF2 or H2O gases.  Bitmap files or vector scan can be used to create complex patterns and shapes.  For TEM sample preparation, an attached microprobe is used to pick-up cross-sectional samples in-situ and transfer them to grids.  The instrument is equipped with an Oxford Instruments XEDS system for elemental identification and quantification.

 

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