Electron Beam Lithography (EBL) Raith ‘e-LiNE’ Ultra high resolution Electron Beam Lithography e_LiNE This EBL is a versatile e-beam system for nano structuring, pattern inspection, dimensional metrology and nano engineering. The e-LiNE electron optical column matches perfectly with a number of key applications in CNT research, thin film engineering, photonic crystals and EBID. Technical Specs: - Laser Height Sensing
- Deflects a laser off the sample surface to maintain focus over large areas.
- Can control with a working distance range of 6.5 to 8.5 mm
- Capable of continuous focus correction.
- Capable of leveling the sample surface for extremely flat substrates
- Gas Injection System (GIS) Option:
- Electron Beam Induced Deposition (EBID)
- Insulators using PMCPS Precursor
- Platinum using (Me3)MeCpPT Precursor
- Tungsten using W(CO)6 Precursor
- Electron Beam Induced Etching (EBIE)
- Water Reactant using MgSO4-7H2O Precursor. Etches PMMA, and Carbon. Can also add O contact to insulators.
- Flourine Reactant using a XeF2 precursor. Etches Silicon Oxide, silicon and tungsten
- Plasma Cleaner
- Capable of cleaning the sample surface of hydrocarbons prior to processing.
- Filament Type: Schottky thermal field emission
- Stage Travel: 100 x 100 x 30 mm
- Beam Size: 2nm @ 20keV
- Beam Current Range: 5 pA - 20 nA
- Beam Energy: 100eV @ 30keV
- Current Density: >7.5 A/cm2
- Current Stability: <5% / hour
- Beam Resolution: 2nm @ 20 keV, 4nm @ 1 keV
- Detector: In lens, Everhart Thornley
- Minimum Line Width: 20nm guaranteed
- Stitching Accuracy: 60nm
- Overlay accuracy: 40nm
- Import file format: GDSII, DXF, ASCII, BMP
| Facility: Fabrication Location: SB 61A User Guide Emergencies dial 4-2121 for Pitt Police Supervisor: Matt France Phone: 412-648-7287 Email: maf138@pitt.edu Co-Supervisor: Mike McDonald Phone: 412-383-5977 Email: mlm97@pitt.edu General Contact Info: Facility Phone: 412-383-8001 Facility Email: nfcfadmn@nano.pitt.edu Benedum Hall 3700 O'Hara Street Pittsburgh, PA 15261 NFCF Lab, SB 60-63 |