Fabrication Facility

Instrumentation List

Lithography

Electron Beam Lithography System: Raith e_LiNE

Dual Beam System (Focused Ion Beam/Electron beam): Seiko Instruments SMI3050SF FIB-SEM with Oxford Instruments INCA XEDS

Nano-imprint Lithography System: Molecular Imprints Imprio 55

Optical Lithography: Mask Aligners Quintel Q-4000-4 and Karl Suss MJB3

Reynoldstech Fabricators: Lithography Hood

Optical Microscope

Inspection Microscope: Carl Zeiss Axio Imager M1m

Thin Film Deposition

Plasma-enhanced Chemical Vapor Deposition System (PECVD): Trion Orion II

Multi-Source Electron Beam Evaporation System: Thermionics VE-180

Dry Etching

Reactive Ion Etching System (RIE): Trion Phantom III LT

Plasma Cleaner: South Bay Technology PC-2000 RF

Surface Profiler

Surface Profiler: KLA-Tencor Alpha-Step IQ

Wet Processing

Single Wafer Spin Processor: Laurell Technologies WS-400B-6NPP-LITE

Reynoldstech Fabricators: Acid Hood and Caustic Hood