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Home › Equipment ›

Fabrication Facility

Fabrication 1Fabrication 2

Instrumentation List

Lithography

Electron Beam Lithography System: Raith e_LiNE

Dual Beam System (Focused Ion Beam/Electron beam): Seiko Instruments SMI3050SF FIB-SEM with Oxford Instruments INCA XEDS

Nano-imprint Lithography System: Molecular Imprints Imprio 55

Optical Lithography: Mask Aligners Quintel Q-4000-4 and Karl Suss MJB3

Reynoldstech Fabricators: Lithography Hood

Optical Microscope

Inspection Microscope: Carl Zeiss Axio Imager M1m

Thin Film Deposition

Plasma-enhanced Chemical Vapor Deposition System (PECVD): Trion Orion II

Multi-Source Electron Beam Evaporation System: Thermionics VE-180

Dry Etching

Reactive Ion Etching System (RIE): Trion Phantom III LT

Plasma Cleaner: South Bay Technology PC-2000 RF

Surface Profiler

Surface Profiler: KLA-Tencor Alpha-Step IQ

Wet Processing

Single Wafer Spin Processor: Laurell Technologies WS-400B-6NPP-LITE

Reynoldstech Fabricators: Acid Hood and Caustic Hood

Equipment

  • Characterization Facility
  • Fabrication Facility
  • FOM
Benedum Hall
3700 O'Hara Street
Pittsburgh, PA 15261
NFCF Lab
SB 60-63 Benedum Hall
nfcf@nano.pitt.edu
412-383-8001
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