Hoods
Hood 1 contains all photoresists, spinners, and hot plates used for photolithography processes. Hood 2 contains all electron beam resists, spinner, and hot plates used for electron beam lithography and is also suited for basic pattern development. Hood 3 offers a wide range of developers and removers, an ultrasonic bath, and hot plates to assist in all non-acidic development and wafer cleaning processes. Hood 4 offers the safety equipment and chemicals necessary for acidic wafer development. Hoods 1, 2, 3, all offer acetone, IPA, methanol, and DI water.
General Documentation
Acid / Caustic Hood SOP (standard operation procedure)
Lithography Hoods 1-3 SOP (standard operation procdure)
Acid/Caustic Hood, processes available:
Acetic Acid Citric Acid Hydrochloric Acid (38%) Hydrogen Peroxide (30%) Hydrofluoric Acid (48%) Lactic Acid Sulfuric Acid Phosphoric Acid | Nitric acid Buffered Oxide Etch, 7:1 with Surfactant Buffered Oxide Etch, 10:1 with Surfactant Al etchant- Transene type D Cr etchant-Transene 1020 Gold Etchant – Type TFA Tantalum Etchant |
Developer hood , chemistry available:
SU-8 Developer (for SU8 and Nanoscribe IP resist) 1165 Remover Remover PG Surpass 3000 (promotor) | MIBK/IPA 1:3 AZ 400T Stripper ZEP 520A Developer (n-Amyl acetate, 99%) ZEP520A Remover |
Inorganic cabinet:
Remover R404 S Developer ma-D 525 351 (UN 1824 Sodium Hydroxide Solution) AZ 300 MIF Developer | AZ 400K 1:4 351 MF-CD-26 Developer Ammonium Sulfide (NH4)2S |
Spinner hood 1:
AZ 400K 1:4 351 MF-CD-26 Developer Ammonium Sulfide (NH4)2S AZ 400K 1:4 351 MF-CD-26 Developer Ammonium Sulfide (NH4)2S AZ 400K 1:4 | AZ P4210 AZ P4110 AZ P4620 LOR 5B AZ 5214-E IR AquaSAVE 532A |
Spinner hood 2:
PMMA 950K A1 PMMA 950K A2 PMMA 950K A3 PMMA 950K A4 PMMA 495K A4 ZEP 520A ZEP 520A 1.7:1 Diluted MCC 80/20 Primer HMDS Primer MHA | PMMA thinner mma(8.5) MAA EL9 mma(8.5) MAA EL13 ma-N 2403 ZEP 520A 2.5:1 ZEP 520A 3.5:1 (weight) Anisole, 99%, Extra Dry AcroSeal Acrylic Polymer PEG-A |
Hood Oven:
Compact drying oven for baking semiconductor samples and heat treatment of bottles. It is an accessory of the hood1.
Key Features
- Temperature range: 10~250 C
- Temperature precision: ± 1 C
- Temperature uniformity: ± 3 C
- Dimensions: 40x46x40 cm
Key Applications and available processes
- Samples baking
- Heat treatment of bottles(with some particular photoresist like viscous SU8)
Contact
Jun Chen, Esta Abelev, or Dan Lamont
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Equipment Fee
Fabrication Service 1
