Fabrication Facility
Instrumentation List
Lithography
Electron Beam Lithography System: Raith e_LiNE
Nano-imprint Lithography System: Molecular Imprints Imprio 55
DipPen Lithography System: Nanoink Nscriptor
Optical Lithography: Mask Aligners Quintel Q-4000-4 and Karl Suss MJB3
Reynoldstech Fabricators: Lithography Hood
Optical Microscope
Inspection Microscope: Carl Zeiss Axio Imager M1m
Thin Film Deposition
Plasma-enhanced Chemical Vapor Deposition System (PECVD): Trion Orion II
Multi-Source Electron Beam Evaporation System: Thermionics VE-180
Dry Etching
Reactive Ion Etching System (RIE): Trion Phantom III LT
Ion Beam Etching/Deposition System: Veeco ME-301
Plasma Cleaner: South Bay Technology PC-2000 RF
Surface Profiler
Surface Profiler: KLA-Tencor Alpha-Step IQ
Wet Processing
Single Wafer Spin Processor: Laurell Technologies WS-400B-6NPP-LITE
