Oxidation/ Annealing Tube Furnace

Oxidation/Annealing Tube furnace

Across International Tube furnace for silicon wafers oxidation and samples annealing.

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Key Features

· Maximum temperature: 1200 C

· Operational temperature: upto 1100 C

· Maximum heating/Cooling rate: < 30°C / min

· Temperature control precision: +/- 1°C

· Flat zone: 10 inch

· Gases available: N2, O2

· Sample size: small pieces up to 4″ wafers

· Vacuum capability coming soon

 

Key Applications and available processes

· Silicon wafers oxidation

· Samples Annealing

General Documentation

Oxidation/Annealing tube furnace SOP (standard operation procedure)

Contact

Jun Chen or Esta Abelev

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Equipment Fee

Fabrication CR Service 1