Oxidation/ Annealing Tube Furnace
Oxidation/Annealing Tube furnace
Across International Tube furnace for silicon wafers oxidation and samples annealing.
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Key Features
· Maximum temperature: 1200 C
· Operational temperature: upto 1100 C
· Maximum heating/Cooling rate: < 30°C / min
· Temperature control precision: +/- 1°C
· Flat zone: 10 inch
· Gases available: N2, O2
· Sample size: small pieces up to 4″ wafers
· Vacuum capability coming soon
Key Applications and available processes
· Silicon wafers oxidation
· Samples Annealing
General Documentation
Oxidation/Annealing tube furnace SOP (standard operation procedure)
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Equipment Fee
Fabrication CR Service 1
