Facilities

The Nanoscale Fabrication and Characterization Facility

PINSE supports the Nanoscale Fabrication and Characterization Facility (NFCF), a 4,000-ft2 cleanroom user facility located in the sub-basement of Benedum Hall. The facility is divided into two sections, Characterization and Fabrication (Cleanroom). 

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Facility Map

Characterization

Image of the Characterization facilityDivider

Electron Microscopes:

Scanning Probe Microscopy

Spectroscopy

Raman Microscope

X-Ray Diffraction

Sample Preparation

 

 

Fabrication (Cleanroom)

Image of the Fabrication facilityDivider

Lithography

Optical Microscope

  • Zeiss Axio Imager Motorized Optical Microscope

Thin Film Deposition

  • Plasma Enhanced Chemical Vapor Deposition (PECVD)
  • Electron Beam Evaporator System (EBE)
  • Hybrid Sputter/Evaporation System (Deposition System AJA)

Dry Etching

  • Reactive Ion Etcher (RIE)
  • Plasma Cleaner

Surface Profiler

  • Surface Profiler: KLA Tencor Alpha-Step IQ Surface

Sample Preparation

  • Acid Hood
  • Caustic Hood