Training Information

Training is required before new users can use any of the NFCF instruments. Training is done by staff or qualified volunteers and is arranged to fit their schedules. Training is performed on a first come first serve basis and is dependent on the status of the machine. There may be a waiting list. Training times vary depending on the level of difficulty for each instrument and additional training may be required by the staff before a user is authorized for full use of the instrument.

The following chart provides detail for planning purposes only.  Length of sessions, number of sessions, and expected personnel for training are provided for review.

If you have not yet registered as a user with our lab click here to get started.  Registration by completing our become a user section is a prerequisite to the equipment training options shown below.

Please click the following link for full detail of training request instructions.

You may also wish to review the group training options we have.

Please note that the training times listed are for basic operation of equipment.  If access to specific attachments or special features are also being requested, additional training time may be required to gain access to the requested attachments or features.

 

Training Information for NFCF                                                                                                       

Equipment/Instrument
 
Training Time
 Staff - Primary
Staff - Secondary
Training Price per hour

(combined staff + equip)

Characterization Facility
     PittNon Profit For Profit 
AFM - Veeco MultiModeV and Bruker Icon IV1 session / 3hr eachDan LamontSusheng Tan80130220
Cressington Carbon Coater1 sessions / 1hr eachDan LamontMatt France80130220
DSC 250- Differential Scanning Calorimeter 1 session / 2hr each Dan Lamont
80130 220 
Ellipsometer  1 session / 2hr each Dan Lamont Susheng Tan80130220
EPMA- Electron Microprobe 6 sessions / 3hr each Susheng Tan
100180 280 
FIB-SEM_FEI Scios Dual Beam 3 sessions / 4hr each Dan Lamont Susheng Tan115195 290 
FT-IR Microscope 1 session / 2hr each Dan Lamont Susheng Tan80130 220
Parylene Deposition Coater PDS 20101 session / 2-3hr eachEsta AbelevMatt France93155255
PLD Deposition System1 session / 2-3hr eachMatt FranceDan Lamont93155 255 
Pd Sputter Coater
  80130 220 
PDMS Preparation Area 1 session / 1hr each Dan Lamont Jun Chen80130 220
Plasma Cleaner P.I.E. 2 sessions / 0.5hr each Susheng Tan Dan Lamont80130 220 
Raman microscope 1 session / 2hr each Dan Lamont Susheng Tan80130 220 
SEM- ZEISS Sigma500 VP 1 session / 3hr each Esta Abelev Dan Lamont100180 280
SEM - FEI Apreo 1 session / 3hr each Esta Abelev Dan Lamont100180280
Sputter Coater Denton 1 session / 0.5hr each Esta Abelev Dan Lamont80130220
STA 6000 Simultaneous Thermal Anayser (TGA/DSC) Dan Lamont 80130 220 
TEM- Hitachi 9500 ETEM 3 sessions / 3hr each Susheng Tan Matt France115195 290 
TEM- JEOL JEM2100F  4 sessions / 3hr each Susheng Tan Dan Lamont115195 290 
TEM- Thermo Scientific Titan Themic G2 200 STEM 4 sessions / 3 hr each Susheng Tan Matt France142225 350 
TGA - Thermogravimetric analysis1 sessions / 2hr eachDan Lamont 80130220
UV-Vis Optical Microscope1 session / 1hr eachDan Lamont 80130220
Wire Bonder West Bond 4KE Jun Chen    
XRD- Bruker D8 XRD System 1 session / 3hr each Dan Lamont Susheng Tan90140 230 
XRD PANanalytical Empyrean 1 sesion / 3hr each Dan Lamont Susheng Tan90140230
Epsilon x-Ray Fluroescence (XRF)  Dan Lamont    
Fischione 1040 NanoMill1 sessions / 2hr eachDan LamontMatt France80130220
Fischione 1050 TEM Mill1 sessions / 1hr eachDan LamontMatt France80130220
Fischione 1060 Ion Mill1 sessions / 1hr eachDan LamontMatt France80130220
Fischione 1070 NanoClean Plasma Cleaner1 sessions / 1hr eachDan LamontMatt France80130220
Fischione 110 Twin Jet Electropolisher1 sessions / 1hr eachDan LamontMatt France80130220
Fischione 170 Ultrasonic Disk Cutter1 sessions / 1hr eachDan LamontMatt France80130220
Fischione Model 200 Dimpling Grinder1 sessions / 1hr eachDan LamontMatt France80130220
 A1 Optical Micrsocope Zeiss Axio (1-2)  1 sessions / 1hr each Dan Lamont Matt France80130 220 
       
 Fabrication (Cleanroom) Facility

      
Equipment/Instrument
 Training Time
Staff - Primary
Staff - Secondary
PittNon Profit For Profit
Deposition System e-Beam Plassys 1 session / 2hr each Matt France Esta Abelev 93155 255 
Deposition System Sputter Angstrom  1 session / 2-3hr each Matt France Esta Abelev 93155 255 
Deposition System Thermal Evaporation Angstrom Matt FranceEsta Abelev  77125 210 
Dicing Saw Reference FOM Jun Chen Dan Lamont 93170 270 
e-Beam Evaporator Thermionics 2 sessions / 2hr each Matt France
 77125 210 
EBL-e-Beam Lithography RAITH 4 sessions / 4hr each Jun Chen Matt France 93170 270 
E-Beam Lithography EBPG5150, 100kV Jun Chen  100 180280 
E-Beam Lithography Beamer, data prep Jun Chen  tbd  
HMDS Oven; YES-3DR 1 session / 1hr each Jun Chen Dan Lamont 77125 210 
Hood; Acid 1 session / 1hr each Jun Chen E.Abelev/D.Lamont 77125 210 
Hood; Litho 1 w/ Spinner 1 session / 1hr each Jun Chen E.Abelev/D.Lamont 77125 210
Hood; Litho 2 w/ Spinner 1 session / 1hr each Jun Chen E.Abelev/D.Lamont 77125 210
Hood; Litho 3 Developing 1 session / 1hr each Jun Chen E.Abelev/D.Lamont 77125 210
Mask Aligner, Quintel 1 session / 1hr each Jun Chen
 77125 210
Maskless aligner, MLA100 1 session / 2-3hr eachJun ChenMatt France93170270
Oxidation Tube Furnace 1 session / 2 hour eachEsta AbelevE.Abelev/J.Chen77125210
Nanoscribe Photonic Professional 1 session / 2-3hr each Jun Chen Esta Abelev 93170 270 
Optical Microscope, cleanroom 1 session / 1hr each Jun Chen E.Abelev/D.Lamont 77125 210
PECVD (Plasma Enhanced Chemical Vapor Deposition) 1 session / 1hr each Matt France Esta Abelev 77125 210 
Plasma Asher- March PX500 1 session / 1hr each Jun Chen Matt France 77125 210 
RIE- Reactive Ion Etcher (Trion) 1 session / 1hr each Jun Chen Esta Abelev 77125 210 
ICP-RIE PlasmaTherm Chlorine1 session / 2 hr eachEsta AbelevM.France/J.Chen 93155 255 
ICP-RIE PlasmaTherm Fluorine1 session / 1 hr each Esta AbelevM.France/J.Chen 93155 255 
RTA- Solaris  1 session / 1hr each Matt France Esta Abelev 77125 210 
Surface Profiler Dektek XT 1 session / 1hr each Jun Chen E.Abelev/D.Lamont 77125 210
Thin Film Analyzer Filmetrics F40 Dan LamontE.Abelev/J.Chen  77125 210 
Ultratech Fiji ALD1 session / 2hr each Matt FranceEsta Abelev93155255

      

You may also wish to review the following related sections:

Equipment Pricing listing, please note that staff hours and equipment hourly cost are charged during training.

Equipment capabilities listings

Lab Policies (policies section currently being updated)

ICP-RIE PlasmaTherm Chlorine