Reactive Ion Etching System (RIE)
The Trion Phantom III LT RIE (Reactive Ion Etching) is an etching system which uses fluoride solutions to etch metal films and compound semiconductors.
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Key Features
- 300 Watts (13.56 MHz) solid state RF generator.
- Substrates up to 8” wafers.
- Mass Flow Controller (MFW) for control of gas flow.
- Gases available: CF4, O2, SF6, CHF3
Key Applications and available processes
- Semiconductor fabrication
- R & D production and application
- Silicon Etching
- Polymers etching
- Glass etching
- MEMS
General Documentation
RIE system SOP (standard operation procedure)
Contact
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Equipment Fee
Fabrication Service 1
