Quintel Contact Mask Aligner

The Quintel Q4000 MA Mask Aligner combines innovative design with precision alignment and exposure features. It supports both vacuum and contact printing and handles partial and whole substrates up to 100mm (4”) diameter.

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Photo of the Quintel Contact Mask AlignerKey Features

  • Substrate sizes from pieces to 100mm (4”) diameter
  • Manual X-Y joystick and micrometer theta alignment stage
  • Print modes: Soft, Pressure or Vacuum modes
  • Print resolution 1micron (with vacuum mode)
  • VideoView CCTV splitfield/ singlefield microscope with zoom
  • Simple topside mask loading
  • Shock Isolation table included as standard
  • Mask size: 4” or 5”
  • IR capability (back side alignment

Key Applications and available processes

  • Patterning
  • MEMS
  • Semiconductor devices

General Documentation

Suss MJB3 Mask Aligner SOP (standard operation procedure)

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Equipment Fee
Fabrication Service 1