Quintel Contact Mask Aligner

The Quintel Q4000 MA Mask Aligner is an efficient and adaptable photolithographic tool. It supports both vacuum and contact printing and effectively exposes both partial and whole substrates up to 100mm (4”) diameter.

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Key Features

• Substrate sizes from pieces to 100mm (4”) diameter
• Manual X-Y joystick and micrometer theta alignment stage
• Print modes: Soft, Pressure or Vacuum modes
• Print resolution 1micron (with vacuum mode)
• VideoView CCTV splitfield/ singlefield microscope with zoom
• Simple topside mask loading
• Shock Isolation table included as standard
• Mask size: 4” or 5”
• IR capability (back side alignment)

Key Applications and available processes

• Patterning
• MEMS
• Semiconductor devices

General Documentation

Suss MJB3 Mask Aligner SOP (standard operation procedure)