Plassys Electron Beam Evaporation System

The Plassys Electron Beam Evaporator MEB550S is a state of the art tool for Electron Beam Evaporation.

……………………………………………………………………………………………………………………………………………………………………………………………………………………………..

Photo of the Plassys

Key Features

  • 8x 15cc crucibles
  • Thin film evaporation of metals with electron beam
  • 10 keV electron beam energy, 10 kW power
  • Substrates up to 100 mm
  • Substrate rotation and tilt
  • Ion gun for sample cleaning and milling
  • Cryo pumped load lock and main chamber
  • Substrate heating up to 850°C
  • Full computer control
  • Available materials: Al, Au, Ti, Ni, Cr, Co, Pt, W, Ag

Key Applications and available processes

  • MEMS
  • Thermal Barriers
  • Transistors
  • Semiconductors
  • Optical devices

General Documentation

PLASSYS ebeam evaporation system SOP (standard operation procedure)

Contact

Matt France or Jun Chen

Check Availability
Already have an account?
Reserve this tool with the FOM.
Need an Account?

Equipment Fee
Fabrication Service 2