Plassys Electron Beam Evaporation System

The Plassys Electron Beam Evaporator MEB550S is a state of the art physical vapor deposition tool that uses an intense electron beam to vaporize a source material under high vacuum, offering a wide range of well-controlled deposition rates for a variety of materials.

……………………………………………………………………………………………………………………………………………………………………………………………………………………………..

Key Features

• 8x 15cc crucibles
• Thin film evaporation of metals with electron beam
• 10 keV electron beam energy, 10 kW power
• Substrates up to 100 mm
• Substrate rotation and tilt
• Ion gun for sample cleaning and milling
• Cryo pumped load lock and main chamber
• Substrate heating up to 850°C
• Full computer control
• Available materials: Al, Au, Ti, Ni, Cr, Co, Pt, W, Ag

Key Applications and available processes

• MEMS
• Thermal Barriers
• Transistors
• Semiconductors
• Optical devices

General Documentation

PLASSYS ebeam evaporation system SOP (standard operation procedure)

Contact

Matt France or Esta Abelev