Nanoscribe 3D Lithography System

The Nanoscribe Photonic Professional is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists. Designed for the fabrication of photonic crystal structures, the instrument is also ideal for, e.g., generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry.

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Key Features

  • Laser power: 50-150 mW, Wavelength: 780 nm, Pulse ~100 fs, Repetition rate: 80 MHz
  • Available for Conventional 3D printing mode, Dip-in Liquid mode and air mode
  • From microscale(submicron) to macroscale(centimeter) 3D printing
  • 3D printing with lateral resolution ~ 200 nm, vertical resolution ~ 300 nm
  • High-precision Piezo scanning range: 300 x 300 x 300 μm3
  • Motorized XY-scanning range: 100 x 100 mm2

Available photoresists

IP-dip, IP-S, IP-L, SU-8 (2001, 2001, 2015, 3050…), AZ4110, AZ4210, AZ4610, AZ5214 IR, S1805, and SC1827.

Key Applications and available processes

  • Mechanical Metamaterials                                •   Biomimetrics
  • Microfluidics                                                      •   Life sciences
  • Photonics                                                          •  Micro-robotics
  • Plasmonics
  • Optical devices

 

General Documentation

Nanoscribe SOP (standard operation procedure)

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Contact

Jun Chen

 

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Equipment Fee

Fabrication Service 2

 

NanoScribe Capabilities

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