Instrument Overview Fabrication Facilities   (Cleanroom) Electron Beam Lithography System - Raith 'E-Line' (EBL) Ultra high resolution electron beam Lithography and Nano Engineering workstation e_LiNE is the most versatile e-beam system for uncompromised nano structuring, pattern inspection, dimensional metrology and nano engineering. The state-of-the-art e_LiNE electron column matches perfectly with a number of key applications in CNT research, thin film engineering, photonic crystals and EBID.   Seiko Instruments 'SMI3500SE FIB-SEM' (FIB) The Seiko Instruments SMI3050SE FIB-SEM instrument combines a Ga+ focused ion beam column for nanoscale fabrication and a field emission SEM for observation during FIB processing. The specified image resolution is 4nm. The common applications of this instrument are for nanoscale patterning/fabrication or TEM sample preparation. The ion beam can be used to remove regions of a sample or to deposit W metal in specified locations and patterns. The material removal process can also be enhanced by the injection of XeF2 or H2O gases. Bitmap files or vector scan can be used to create complex patterns and shapes. For TEM sample preparation, an attached microprobe is used to “pick-up” cross-sectional samples in-situ and transfer them to grids. The instrument is also equipped with an Oxford Instruments XEDS system for elemental identification and quantification.   South Bay Technology 'PC 2000' The PC 2000 is a compact, easy to use, parallel plate plasma cleaning system designed specifically for the removal of hydrocarbon contamination form a specimen and specimen stage. The specimen and stage are subjected to reactive gas plasma which efficiently removes a wide range of contaminants. The specimen can be placed on the 8” diameter stage or mounted in a TEM holder. Our unit has both an Argon and Oxygen supply. Samples can be cleaned with an Ar, O2 or mixed gas plasma. Trion Technology 'Phantom 111 RIE' (RIE) The Phantom III RIE system is a plasma etch system designed to supply research laboratories with state-of-the-art-plasma etch capability for single wafers and small samples. Our RIE system has four process gases for etching a variety of materials. It can also be used for stripping photoresists and other organic materials. The system is controlled by user friendly touch screen computer system. Recipes may be stored on the computer for repeated runs under the same conditions.     Thermionics Laboratory 'VE180' (VE180) The model VE-180 provides thin film coating of virtually any material quickly, cleanly and efficiently. Our system is equipped with; 3 kW 4 pocket e-Gun, thickness monitoring, sample heater and indirect temperature monitoring. A variety of evaporation source materials are available. The system has an ultimate vacuum on the order or 1.1 x 10-7 with a vacuum of 5 x 10-5 or better recommended for deposition.   Trion Technology 'Orion 111 PECVD' (PECVD) The Orion III PECVD system is a plasma deposition system designed to supply research laboratories with state-of-the-art plasma etch capability for single wafers and small samples. Our PECVD system has four process gases for deposition of films such as silicon dioxide, silicon nitride and polysilicon. The system is controlled by user friendly touch screen computer system. Recipes may be stored on the computer for repeated runs under the same conditions.     Laurell Technologies 'WS-400B' (SPIN Processor) The WS-400 is a single wafer, manual dispense spin processor with a nitrogen purged process chamber and is controlled by a digital controller. The wafer is held in place during process by means of a vacuum chuck. The digital controller has twenty programs each with fifty one steps stored in non-volatile memory. The program sizes and steps/program can be changed.   Quintel 'Q4000 MA' The Q4000 Mask Alignment System is an integrated optical-mechanical, pneumatic-electrical system which allows accurate alignment of sensitized semiconductor wafers or substrates with a mask and exposes them to ultraviolet radiation to transfer the pattern of the mask to the substrate for further processing on the way to producing a semiconductor or other microelectronic device. Optical and mechanical functions of the aligner are coordinated in a manner that will allow an operator to learn the system in a few hours.   KLA Tencor 'Alpha-Step IQ' The alpha-Step IQ Profiler is a computerized, highly sensitive surface profiler that measures roughness, waviness and step height in a variety of applications. It features the ability to measure micro-roughness, with up to 0.1-nm or less resolution, over short distances as well as waviness in a scan over a full surface length of 10-mm. The computer offers powerful measurement control and analysis.   Zeiss 'Axio Imager' Optical Microscope The Axio Imager is an optical microscope equipped with next generation optics which have superb contrast and excellent resolution. The microscope design is optimized for maximum stability and vibration-free work. Many functions including objective lens selection are touch screen controlled for easy to obtained, repeatable results. The microscope is also equipped with a digital camera and image recording system. Image recording and analysis is accomplished through multidimensional acquisition methods and comprehensive measurement and analysis functions.   Acid Hood - Reynoldstech Fabricators The hood is equipped with a sink and DI water faucet. They are also equipped with dry nitrogen and DI water sprayers and vacuum connections. The DI water supply is distilled water that is then filtered and supplied at 18 Meg ohm or better. There are ultrasonic shakers, digital and stirring hot plates available. Normally used chemicals are stocked. Caustic Hood - Reynoldstech Fabricators The hood is equipped with a sink and DI water faucet. They are also equipped with dry nitrogen and DI water sprayers and vacuum connections. The DI water supply is distilled water that is then filtered and supplied at 18 Meg ohm or better. There are ultrasonic shakers, digital and stirring hot plates available. Normally used chemicals are stocked.   Lithography Hood - Reynoldstech Fabricators The hood is equipped with a sink and DI water faucet. It is also equipped dry nitrogen and DI water sprayers and vacuum connections. The DI water supply is distilled water that is then filtered and supplied at 18 Meg ohm or better. There is an ultrasonic shaker and digital and stirring hot plates available for the hood. The wafer spinner is located in this hood. In addition to solvents a variety of photoresists are stocked for use in this hood.   Characterization Facilities Transmission Electron Microscope - JEOL 'JEM-2100F' (TEM) The JEOL JEM-2100F is a modern computer-controlled high-resolution transmission electron microscope (HR-TEM) with excellent analytical performance for daily use in a multi-user environment. The configuration of the instrument combine ease-of-use with capability for routine atomic resolution imaging of crystal lattices by coherent electron scattering or phase contrast (TEM) and by incoherent electron scattering or Z-contrast in the scanning transmission electron microscopy (STEM) mode.  For analytical TEM, i.e., diffraction for crystal structure determination and crystallographic studies, analysis of elemental composition and chemistry (electronic bonding) by X-ray energy dispersive spectroscopy (XEDS) and electron energy-loss spectroscopy (EELS), it offers routinely local spatial resolution at 2nm or better. When operated in STEM mode the instrument offers electron probes as small as 0.16nm for incoherent imaging and of 0.5nm for analytical purposes of XEDS and EELS. The JEM-2100F is equipped with attachments for XEDS analysis from Oxfrod Instruments (Inca platform) and a GIF TRIDIEM post-column energy filter (Gatan Inc.) fro acquisition of energy-filtered images and diffraction. Hence, atomic column resolution imaging, elemental composition and local electronic structure measurement are a possibility with this modern field-emission TEM/STEM. The JEM-2100F HR-TEM operates with a Schottky field-emission electron gun (FEG) at 120kV up to 200kV, offers large sample tilt (=30° X- & Y-tilt) combined with superior XEDS sensitivity (due to increased acceptance angle ˜0.3sr w.r.t. standard ˜0.1sr) without significantly affecting image resolution, achieving 0.22nm point resolution and information limit of about 0.16nm in TEM mode. Extension of image resolution towards the information limit by exit-plane wave function reconstruction from combined beam-tilt and through focal-series is available [1=12], and greatly aided by improved beam and stage stability. In gold (Au) test specimens the good stability of the instrument facilitates lattice periodicity resolution to 0.102nm on a routine basis. In TEM and STEM mode the FEG produces intense electron point probes with diameters of 0.5nm and down to 0.16nm, respectively, carrying sufficient current to provide for local diffraction, compositional and chemical analysis with sub-nanometer resolution. Using the high-angle annular dark-field (HAADF) detector enables atomic-number sensitive incoherent (Z-contrast) imaging with atomic column resolution [2=45,3=46]. The XEDS system enables detection of Be or heavier elements (atomic number Z=4) and XEDS mapping of the fields of view captured in images. The post-column energy-filter is a very powerful component of the system, facilitating energy-filtered (EF) TEM and EELS. Forcing the electrons scattered by the specimen onto an energy-dispersive path and onto a CCD-camera facilitates EELS with resolution of 1.05eV (1s acquisition, 200kV, 180µA emission current) and 0.63eV (1s acquisition, 200kV, 40µA emission current). Use of the energy-selecting slit allows zero-loss (ZL) filtering for imaging and diffraction with only elastically scattered electrons, which increases contrast in phase contrast (HREM) and diffraction contrast images, facilitates use of thicker specimens and quantitative electron diffraction (QED), especially useful in combination with convergent beam ED (CBED). Electron spectroscopic imaging (ESI) in TEM mode is accomplished by use of the energy-selecting slit to form images of an element specific energy-loss and enables rapid elemental mapping directly in the EF-TEM images, which has great advantages over XEDS mapping w.r.t. speed of acquisition. Finally, the instrument can be operated remotely via the university network, which further improves beam and sample stage stability, ready incorporation into teaching and outreach activities, and minimizes potential of physical damage due to user error. This combination of capabilities for routine sub-nanometer resolution elemental composition, chemical (bonding) mapping, EFTEM with element-sensitive ESI, zero-loss filtering for quantitative diffraction and contrast enhancement, especially for thick specimens, together with atomic-column resolution HREM and/or Z-contrast imaging supports research needs in the physical sciences and engineering at the University of Pittsburgh and is a regional resource available to non-Pitt users via collaborative efforts.   Scanning Probe Microscope - Veeco Manifold ‘Multimode V' & ‘Dimension V' Combination SPM (SPM) By combining the Multimode V SPM and the Dimension V SPM with several advanced application modules, the manifold SPM combination offers AFM (Atomic Force Microscopy) and LFM (Lateral Force Microscopy) both in ambient and liquid conditions, MFM (Magnetic Force Microscopy), EFM (Electrostatic Force Microscopy), SCM (Scanning Capacitance Microscopy), TUNA (Tunneling AFM), and SSRM (Scanning Spreading Resistance Microscopy) in ambient condition. The SPM Combination, controlled by Veeco's most advanced controller--Nanoscope V, can generate up to 5120x5120 pixel density and acquire and display up to 8 images simultaneously. The Nanoscope V controller supports standard and advanced SPM scanning modes including contact mode, tapping mode, force modulation mode, tensional resonance mode, and etc. The Multimode V SPM routinely achieves atomic resolution both in air and liquid while the Dimension V SPM is able to characterize sample in wafer size with sub-nm resolution.   UV-Visible-NIR Microspectrophotometer - Craic QDI 2010 (Microspectrophotometer) The QDI 2010 Microspectrophotometer combines the latest technologies to allow the user to measure UV-visible-NIR range transmission, absorbance, reflectance, emission and fluorescence spectra of samples ranging from the sub-micron to well over 100 microns across.  And while microspectra are being acquired, the sample may be simultaneously viewed with a high-resolution digital imaging system or through eyepieces with the DirecVu package and research grade microscope optics.  Deep UV and NIR digital imaging are new capabilities for this instrument. Key Advantages of this system include: Deep UV to NIR microspectroscopy Deep UV to NIR imaging Integrated TE cooled array detector for low noise and long term stability Ultraviolet-visible-NIR spectra in one shot... No changing optics! Transmission, reflectance, fluorescence, and polarization spectroscopy of microscopic samples...all with the same microspectrometer Variable measurement areas down to sub-micron  Superior image both with eyepieces and digital imaging Easy to use and maintain   Ellipsometer VUV - NIR - Horiba Jobin Yvon ‘UVISEL' (Ellipsometer) The HORIBAJOBINYVON UVISEL Spectroscopic Phase Modulated Ellipsometer (SPME) is a unique instrument that incorporates photoelastic device to modulate the polarization without any mechanical movement. The phase modulation technology provides significant advantages in terms of performance and experimental versatility.    When compared to conventional ellipsometers the UVISEL spectroscopic ellipsometer features high accuracy determination of the ellipsometric angles (Y, D) across their full range allowing superior precision and sensitivity for the characterization of transparent substrates, ultra-thin films and films with low index contrast.    Owing to the phase modulation technology the UVISEL spectroscopic ellipsometer performs advanced measurements of the degree of polarization, anisotropy and Mueller Matrix elements. The fastest acquisition speed at up to 1ms / point is guaranteed making the instrument the ideal solution for dynamic studies and liquid-surface measurements.     The UVISEL is a versatile spectroscopic ellipsometer. It covers a wide spectral range from 190 to 2100 nm and offers a large range of automation features and accessories to best match the system capabilities to your experiment's demand. Its modular design allows the UVISEL to be used ex-situ, in-situ or to be integrated into a cabinet to provide a smaller footprint and clean-room compatibility. Key features inclued:    Spectroscopic Phase Modulated Ellipsometer Highest precision and sensitivity Wide spectral range : 190 to 2100 nm Modular design Fully integrated spectroscopic ellipsometry software package X-ray Diffractometer - Bruker AXS 'D8 Discover' (XRD) The D8 DISCOVER brings innovative Thin Film Solutions from the forefront of research to quality control, product and process development. Based on the D8 platform with reliable mechanics and ergonomic design the D8 DISCOVER includes a whole set of unique advantages:   Third generation Göbel Mirrors providing the highest x-ray flux density – essential for all thin film applications. The entire system is designed for easy and failsafe operation. Tools like the motorized absorber allow fully automatic operation without user intervention. High performance optics are selected and exchanged to provide the optimum resolution for each application and sample. Optimal sample handling takes advantage of the new UMC stages as well as different types of Eulerian cradles for e.g. residual stress, texture, micro-diffraction investigations. For x-ray reflectometry on coatings or semiconductors dedicated stages allow even temperature studies. Shortest measurement times are achieved using Ultra GID for nanometer layers and the VANTEC-1 detector for reciprocal space maps. XRD Wizard and XRD Commander support the user in the most intuitive creation of comprehensive measurements; intelligent scripts take care of the routine work. The evaluation programs LEPTOS and MULTEX Area guarantee that you stay on the forefront of science. Fourier Transform - Infrared Spectrometer w/ Microscope – Bruker Optics 'Vertex 70' / 'Hyperion 2000' (FT-IR) Bruker Vertex-70LS FTIR and Hyperion 2000 FTIR Microscope The Bruker Vertex-70LS FTIR is an extremely versatile research-grade step-scan spectrometer operating in the mid- and far-IR spectral regions. The main optical bench is equipped with both extended range KBr and multilayer beamsplitters (10,000-400 and 680-30 cm -1 , respectively) as well as liquid nitrogen cooled MCT A (12,000-600 cm -1 ) and FIR DLATGS (700-10 cm -1 ) detectors. Spectral resolution is adjustable with a maximum resolution of 0.4cm -1 . Standard IR sampling accessories are available including a pellet press and wig-l-bug for KBr pellets as well as transmission cells for mulls and neat liquids. The Vertex-70 is equipped with a step-scan interferometer and internal digital signal processing which can be used for time-resolved FTIR spectroscopy with a resolution of 5 msec, with either an internal or external trigger, and with phase or amplitude modulation. A variety of additional sampling options are available with the Vertex FTIR bench, including: Bruker Hyperion 2000 FTIR microscope. The advanced Hyperion 2000 microscope is equipped with an automated x, y-stage for line scans and mapping applications. It has optics for both transmitted and reflected light, is equipped with a mid-band MCT A detector (liquid nitrogen cooled, 7000-600 cm -1 spectral range), and has facilities for image and video capture with visible light via a frame grabber. A selection of objectives are available including ATR (Ge, 20x), grazing angle (with polarizer), 15x IR/vis (for transmitted and reflected light), and 4x vis. Pike MIRacle single bounce attenuated total reflectance accessory (ATR, ZnSe IRE) with automatic purging of the optical path for fast and simple analysis of solids, liquids, pasts, gels, and other materials. Temperature controlled liquid cell with variable path length (6 mm to 1mm) and programmable temperature controller. Harrick Auto-Seagull automated variable angle IRRAS accessory for variable angle specular reflectance in the range of 5 o to 85 o . The Seagull can also be used for diffuse reflectance FTIR spectroscopy (DRIFTS) and variable angle attenuated total reflectance (ATR) for depth profiling. The Seagull is equipped with a KRS-5 rotatable polarizer and DRIFTS sample cup, but is not currently configured for ATR spectroscopy. A Manning Applied Technologies PM-100 polymer stretcher and modulator for 2D/3D FTIR correlation spectroscopy and rheooptical studies on perturbed polymer films. The stretcher is equipped for temperature control up to 70 o C (TC-100 controller) and can supply a strain amplitude of 0-0.6% (0-75 mm) at up to 70Hz with programmable waveforms.   General Purpose Hood - Reynoldstech Fabricators (GP Hood) The hood is equipped with a sink and DI water faucet. It is also equipped with dry nitrogen and DI water sprayers and vacuum connections. The DI water supply is distilled water that is then filtered and supplied at 18 meg ohm or better. There is an ultrasonic shakers & hot plate available. Normally used chemicals are stocked.   Renishaw inVia Raman microscope The Renishaw inVia Raman microscope combines simplicity of operation with high performance and flexibility. The inVia Raman microscope is a high-sensitivity system with an integrated research grade microscope, which enables high resolution confocal measurements. The system supports multiple lasers, with automatic software switching of excitation wavelength. The current system includes the following excitation wavelengths: 229 nm, 488 nm, 633 nm, and 785 nm.